I started my PhD in September and familiarized myself with the e-beam lithography system (e_Line) and its Gas Injection System (GIS) from OrsayPhysics to do Electron-Beam Induced Deposition.
It was planned to switch the GIS to another GIS made from Zeiss and last week with the help of my collegue, we installed it and it finally works ! (after several tries...).
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