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Progress on Suspended TI-junction

Updated: Sep 14, 2020

Over the past few weeks, I was trying to optimize the E-beam lithography recipes for making suspended nano junctions with Bi2Se3 nanobelts. There were mainly two challenges : (a) charging effects and related effects on pattern resolution and (b) difficulties in focusing the electron optics as the height measurement on a bare sapphire substrate is not accurate. We found that using a properly adjusted proximity error correction file and opting to use a 20 nm Cr layer on top of the resist stack solves both of these EBL problems. An SEM image of one of the first junctions I made is given below. Although this set of devices from the first batch did not perform as we wanted, with some modifications we hope to do gate-controlled transport measurements on TI-junctions in the coming months.

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2 more PhD defenses coming up !

Hey everyone, it has been a while, but we are back online. Ananthu and Naveen will be defending their theses on December 1st and 8th. If you want to follow remotely, just get in touch!


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