Progress on Suspended TI-junction

Updated: Sep 14

Over the past few weeks, I was trying to optimize the E-beam lithography recipes for making suspended nano junctions with Bi2Se3 nanobelts. There were mainly two challenges : (a) charging effects and related effects on pattern resolution and (b) difficulties in focusing the electron optics as the height measurement on a bare sapphire substrate is not accurate. We found that using a properly adjusted proximity error correction file and opting to use a 20 nm Cr layer on top of the resist stack solves both of these EBL problems. An SEM image of one of the first junctions I made is given below. Although this set of devices from the first batch did not perform as we wanted, with some modifications we hope to do gate-controlled transport measurements on TI-junctions in the coming months.



16 views

Recent Posts

See All

Course on "Open quantum systems"

All this autumn I will be assisting in teaching the lecture course on Open quantum systems in collaboration between Aalto and Helsinki University. We had our first lecture today on the experimental pa

For Questions /  Contact us at contact@questech.org

Webmaster Clotilde BONHOURE-EFFANTIN